Laboratory & Clean Room

Laboratory & Clean Room

Semiconductor manufacturing, biopharmaceuticals and other super clean rooms have stringent requirements for air cleanliness, and AMC concentrations need to be controlled at ppb level. The microporous oriented adsorption ability of activated carbon can accurately retain pollutants with molecular weights of 200-500 Da to ensure the stability of the production environment.

Description

Laboratory Fresh Air System

Generating Scenes

chemical reagent volatilization, laboratory exhaust, disinfectant residue, equipment emissions, etc.

Adsorption targets

heavy metal vapor, radioactive iodine (I-131), VOCs, acidic/alkaline gases, odors and disinfection by-products, microbial metabolites

Application Scenes

chemical Laboratory, biosafety laboratories (BSL-2/3), analytical Test Room, animal room and cell room

Treatment Technology

AC adsorption: GAC canister, honeycomb AC module, modified AC

Combination process: AC – HEPA combination, UV photolysis – AC combination, catalytic oxidation – AC regeneration

Clarkson Activated Carbon Series

CKC-LAB-TCLR, CKC-LAB-CHTC

Case

VOCs treatment in a university chemistry lab

Problem: Organic synthesis experiments lead to indoor C7H8 concentration 2.5mg/m³, exceeding the national standard 5 times.

Solution: Installation of honeycomb AC filter + UV photolysis device, air volume 2000m³/h.

Effect: C7H8 concentration reduced to 0.3mg/m³, and the annual carbon consumption reduced by 40%.

Air Purification in Super Clean Room

Semiconductor manufacturing, biopharmaceuticals and other super clean rooms have stringent requirements for air cleanliness, and AMC concentrations need to be controlled at ppb level. The microporous oriented adsorption ability of activated carbon can accurately retain pollutants with molecular weights of 200-500 Da to ensure the stability of the production environment.

Generating Scenes

process emission pollution, pollution introduced by personnel and equipment, external air infiltration, etc.

Adsorption Targets

HF, HCl, H₂SO₄ vapors, amines, VOCs, Ozone and odors, microbial risk

Application Scenes

semiconductor fabs, biopharmaceutical aseptic workshop, aerospace precision assembly room

Treatment Technology

AC adsorption, modified AC, fixed bed adsorption

Combined system: HEPA/ULPA+AC, ion exchange+AC

Clarkson Activated Carbon Series

CKC-SC-TCLR, CKC-SC-CHTC

Case

AMC control in lithography area of a semiconductor fab

Background: Photoresist solvent (PGMEA) led to lens fogging and yield drop 5%.

Solution: added modified AC chemical filters, thickness 30cm , to the circulating air system.

Effect: PGMEA concentration was reduced from 0.5 ppm to 0.02 ppm, and the lens cleaning cycle was extended by 3 times.

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